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The Hydrogenation Process of the Gd3Ni Compound
N.V.Tristan1, T. Palewski1, H. Drulis2, L. Folcik2, S.A. Nikitin1,3
1International Laboratory of High Magnetic Fields and Low Temperatures, Wrocław, Poland
2Institute of Low Temperatures and Structure Research, Wrocław, Poland
3Faculty of Physics, Moscow State University, Vorobievy Gory, Russia
Semiconductor Heterostructures and Device Structures Investigated By Photoreflectance Spectroscopy
J. Misiewicz, P. Sitarek, G. Sęk, R. Kudrawiec
Institute of Physics, Wrocław University of Technology, Poland
Combined SNOM/AFM Microscopy with Micromachined Nanoapertures
J. Radojewski1, P. Grabiec2
1Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Poland
2Institute of Electron Technology, Warsaw, Poland
Thermal Characterization of Copper Thin Films Made by Means of Sputtering
R.F. Szeloch, W.M. Posadkowski, T.P. Gotszalk, P.Janus, T. Kowaliw
Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Poland
Abstract
Copper thin films have been deposited onto Corning glass substrates by means of two kinds of DC magnetron sputtering. The goal of this research was to study differences in thermal characteristics of both kinds of the films. The differences between these layers originate from the technological processes; one of them employs an inert gas -- argon -- in the vacuum chamber, and the other is the so-called "pure" self-sputtering. Thermal characterization of the layers was performed using the scanning thermal microscopy (SThM) as well as a far field thermographical system.
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Download article (PDF)Application of Electrostatic Force Microscopy in Nanosystem Diagnostics
T.P. Gotszalk1, P. Grabiec2, I.W. Rangelow3
1Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Poland
2Institute of Electron Technology, Warsaw, Poland
3Institute of Technological Physics, University of Kassel, Germany
Wavelet Shrinkage-based Noise Reduction From The High Resolution X-ray Images of Epitaxial Layers
J. Kozłowski1, J. Serafińczuk1, A. Kozik2
1Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Poland
2Institute of Engineering Cybernetics, Wrocław University of Technology, Poland
